The Themis S S/TEM benefits for Semiconductors include:
- The best combination of high resolution and high-throughput analytics. The lens configuration makes this available only on the Themis column. It provides the best image resolution together with the highest EDS efficiency.
- The most trustable measurement accuracy. With ≤2% measurement uncertainty, the critical dimension measurement is trustable, repeatable, and consistent.
- The highest versatility. The combination of optics, chemical detection, wide gap pole-piece, and unique application software ensures a wide range of applications covered by the platform.
Fastest time to data
Themis S S/TEM achieves the fastest time to data by using a combination of the Piezo stage and drift corrected frame integration (DCFI) to compensate for possible specimen drift. This makes it possible to acquire high-quality
high-resolution images in both TEM and STEM modes only minutes after sample loading.
To optimize productivity, Themis S S/TEM uses double-coil constant power lenses to minimize the thermal drift and maximize the system
throughput. This design eliminates heating variation in the lens when switching between modes, such as changing from low-magnification mode for feature searching and high-magnification mode for imaging.