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Helios G4 PFIB HXe Datasheet for Semiconductors

The Helios G4 PFIB CXe is the fourth generation advanced PFIB DualBeam platform for large area sample preparation and analysis in semiconductor failure analysis, process development, process control, and materials characterization labs. The Helios G4 PFIB system combines the unique Elstar™ electron column with UC+ technology for high-resolution, sub 500eV imaging and endpointing with the high-performance PFIB 2.0 Xenon plasma ion column, for fast, precise, and damage-free large area sample cross-sectioning and deprocessing.

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