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Helios G4 PFIB CXe Datasheet for Semiconductors

The Helios G4 PFIB CXe is the fourth generation advanced PFIB DualBeam platform for large area sample preparation and analysis in semiconductor failure analysis, process development, process control, and materials characterization labs. The Helios G4 PFIB system combines the unique Thermo Scientific™ Elstar™ electron column with UC+ technology for high-resolution, sub 500eV imaging and end-pointing with the high-performance PFIB2.0 Xenon plasma ion column, for fast, precise, and damage free large area sample cross-sectioning and deprocessing.

In addition to the industry leading SEM and FIB columns, the Helios G4 PFIB incorporates a suite of innovative technologies and automation which enable simple and consistent sample preparation on even the most challenging samples.

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