Helios G4 EXL
The Helios G4 EXL DualBeam instrument is the only full-wafer system capable of preparing TEM samples as thin as 7nm. This DualBeam FIB-SEM is flexible enough for use in either the lab or the fab. A variety of technological advances and automation converge to enable more precise low-damage milling, higher resolution imaging, and greater speed and reproducibility.