Customized and prototype nano-writing and machining steps are possible with FEI's direct-write electron and ion beam lithography capabilities. Two-dimensional surfaces can be nano-textured over large areas, or detailed 3D topography can be produced for nano-replication or direct prototyping needs. Software provides accurate control over patterning, milling and deposition parameters while deposited material also can be combined with probing for direct electrical measurements.
FEI's DualBeam™ SEM/FIB instruments offer beam/gas chemistries, software automation, digital pattern generation, and simultaneous patterning and imaging that allow creation or modification of structures at the nanoscale. Samples as diverse as quantum dot arrays, individual SQUID junctions, large-area magnetic domain devices, automated AFM tips' customization, large photonic arrays, patterning, photolithographic mask writing and repair, or electron and ion beam lithography are all possible with FEI's robust suite of tools for direct beam-writing fabrication.
FEI systems for nanoprototyping include the following: